Grey scale structures formation in SU-8 with e-beam and UV

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 306-311

  Kudryashov, V ^a,b   Yuan, X C ^a   Cheong, W C ^a   Radhakrishnan, K ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

E beam lithography; Grey scale lithography; Negative resist structure profile; SU 8

Indexed keywords

GLASS; MASKS; OPTICAL DEVICES; ULTRAVIOLET RADIATION;

GREY SCALE LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0038020947     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00083-2     Document Type: Conference Paper

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