Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterning

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 233-237

  Pepin A ^a   Studer, V ^a   Decanini, D ^a   Chen, Y ^a  

^a CNRS   (France)

Author keywords

Electron beam lithography; High sensitivity; Negative resist; SU 8

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; GLASS; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; SILICON WAFERS; SPIN COATING; THIN FILMS;

GLASS SUBSTRATES; HIGH SENSITIVITY; NEGATIVE RESISTS; SU-8;

PHOTORESISTS;

EID: 17344375395     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00104-2     Document Type: Conference Paper

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