Electron beam lithography process for T- and Γ-shaped gate fabrication using chemically amplified DUV resists and PMMA

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2507-2511

  Chen, Y ^a   Macintyre, D ^a   Thorns, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040708838     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591119     Document Type: Article

References (9)

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