Microstructural evolution of allylamine polymerized plasma films

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 5902-5907

  Lejeune, Michaël ^a   Brétagnol, Frédéric ^a   Ceccone, Giacomo ^a   Colpo, Pascal ^a   Rossi, François ^a  

^a JOINT RESEARCH CENTRE   (Italy)

Author keywords

Fourier transform infrared spectroscopy; Microstructure; Physical vapour deposition (PVD); Polymers

Indexed keywords

CARBON NITRIDE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASTIC FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALLYLAMINE POLYMERIZED PLASMA FILMS; CARBON NITRIDE THIN FILMS; MICROSTRUCTURAL EVOLUTION;

THIN FILMS;

CARBON NITRIDE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASTIC FILMS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33645807199     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.09.003     Document Type: Article

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