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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 4722-4725

Effects of oxygen gas addition and substrate cooling on preparation of amorphous carbon nitride films by magnetron sputtering

(3) Yokomichi, Haruo a Sakima, Hiroyuki a Masuda, Atsushi b

a TOYAMA PREFECTURAL UNIVERSITY (Japan)

b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (Japan)

Author keywords

Amorphous carbon nitride; C N bond; Dangling bond; Oxygen gas addition; sp2 structural region; Substrate cooling

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL BONDS; COMPOSITION EFFECTS; COOLING; ELECTRON SPIN RESONANCE SPECTROSCOPY; ELECTRONIC STRUCTURE; LIGHT ABSORPTION; MAGNETRON SPUTTERING; NITRIDES; OXYGEN; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

INFRARED ABSORPTION; OXYGEN GAS ADDITION; SUBSTRATE COOLING; ULTRAVIOLET VISUAL SPECTROSCOPY;

FILM PREPARATION;

EID: 0032155177 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.37.4722 Document Type: Article

Times cited : (7)

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