Internal stress of sputtered amorphous carbon nitride thin films

Solid State Communications

Volumn 131, Issue 7, 2004, Pages 425-429

  Durand Drouhin, O ^a   Benlahsen, M ^a  

^a Universite de Picardie Jules Verne   (France)

Author keywords

A. Disordered systems; A. Surface and interfaces; A. Thin films; D. Mechanical properties

Indexed keywords

CHEMICAL BONDS; COMPRESSIVE STRESS; CONTAMINATION; FILM GROWTH; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SILICON WAFERS; SPUTTER DEPOSITION; STOICHIOMETRY; STRESS RELAXATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BOND DISTOTION; DISORDERED SYSTEMS; NITROGEN PLASMA; SURFACE AND INTERFACES;

THIN FILMS;

EID: 3142745390     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2004.06.013     Document Type: Article

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