Atomic force microscopic nanolithography on hafnium oxide thin film grown on Si(100)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 B, 2006, Pages 2067-2069

  Lo, Rong Li ^a   Lee, W C ^a   Kwo, J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Anodic oxidation; Atomic force microscopy; Hafnium oxide; HF etching

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; HAFNIUM COMPOUNDS; NANOTECHNOLOGY; SILICON;

HAFNIUM OXIDE; HF ETCHING; WET ETCHING;

THIN FILMS;

EID: 33645500313     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.2067     Document Type: Article

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