Characterization of deep wet etching of glass

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6037, Issue , 2006, Pages

  Iliescu, Ciprian ^a   Chen, Bangtao ^a   Tay, Francis E H ^a,b   Xu, Guolin ^a   Miao, Jianmin ^c  

^a INSTITUTE OF BIOENGINEERING AND NANOTECHNOLOGY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Etch rate; Masking layers; Wet etching of glass

Indexed keywords

ANNEALING; COMPOSITION EFFECTS; COMPRESSIVE STRESS; CRACKS; ETCHING;

ETCH RATE; MASKING LAYERS; WET ETCHING OF GLASS;

GLASS;

EID: 33645222431     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.638521     Document Type: Conference Paper

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