Growth of In2O3 single-crystalline film on sapphire (0 0 0 1) substrate by molecular beam epitaxy

Journal of Crystal Growth

Volumn 289, Issue 2, 2006, Pages 686-689

  Mei, Z X ^a   Wang, Y ^a   Du, X L ^a   Zeng, Z Q ^a   Ying, M J ^a   Zheng, H ^a   Jia, J F ^a   Xue, Q K ^a   Zhang, Z ^b  

^a INSTITUTE OF PHYSICS   (China)

^b BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

A1. Reflection high energy electron diffraction; A1. Sapphire (0 0 0 1) substrate; A1. Twin crystal; A3. Molecular beam epitaxy; B2. In2O 3; B2. Transparent conductive oxide

Indexed keywords

ELECTRON DIFFRACTION; MOLECULAR BEAM EPITAXY; OPTOELECTRONIC DEVICES; SAPPHIRE; SINGLE CRYSTALS; THIN FILMS;

REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION; SAPPHIRE (0 0 0 1) SUBSTRATE; TWIN CRYSTAL;

INDIUM COMPOUNDS;

EID: 33644857836     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.12.086     Document Type: Article

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