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Journal of Applied Physics

Volumn 91, Issue 6, 2002, Pages 3547-3550

Surface morphology and crystal quality of low resistive indium tin oxide grown on yittria-stabilized zirconia

(4) Ohta, Hiromichi a Orita, Masahiro a Hirano, Masahiro a Hosono, Hideo b

a JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

b TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); ATOMICALLY FLAT SURFACE; CLEAVED SURFACES; COLUMNAR STRUCTURES; CRYSTAL QUALITIES; ELECTRICALLY CONDUCTIVE; FLAT TERRACES; GRAIN SIZE; HIGH RESOLUTION X RAY DIFFRACTION; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; ITO FILMS; ITO THIN FILMS; OUT-OF-PLANE; OXYGEN PRESSURE; PULSED-LASER DEPOSITION TECHNIQUE; SPIRAL GROWTH; SURFACE FLATNESS; X RAY ROCKING CURVE;

ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; GROWTH TEMPERATURE; INDIUM COMPOUNDS; OXYGEN; PULSED LASER DEPOSITION; SUPERCONDUCTING FILMS; SURFACE MORPHOLOGY; THIN FILMS; TIN; TIN OXIDES; X RAY DIFFRACTION; YTTRIA STABILIZED ZIRCONIA; ZIRCONIA;

FILM GROWTH;

EID: 0037087356 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1448873 Document Type: Article

Times cited : (124)

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