Image imbalance compensation in Alternating Phase-Shift Masks towards the 45nm node through-pitch Imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Van Look, Lieve ^a   Kasprowicz, Bryan ^b   Zibold, Axel ^c   Degel, Wolfgang ^c   Vandenberghe, Geert ^a  

^a IMEC   (Belgium)

^b PHOTRONICS INC   (United States)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

3D mask simulation; Aerial image; Alternating phase shift mask; Image imbalance; Intensity imbalance

Indexed keywords

IMAGE ENHANCEMENT; IMAGING SYSTEMS; MASKS; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY;

3D-MASK SIMULATION; AERIAL IMAGE; ALTERNATING PHASE-SHIFT MASK; IMAGE IMBALANCE; INTENSITY IMBALANCE;

IMAGE ANALYSIS;

EID: 33644593856     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632112     Document Type: Conference Paper

References (12)

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