Balancing of alternating phase shifting masks for practical application: Modeling and experimental verification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 372-383

  Griesinger, U A ^a   Mader, L ^a   Semmler, A ^a   Dettmann, W ^a   Noelscher, C ^a   Pforr, R ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

3D mask simulation; AIMS; Alternating phase shifting mask; Phase balancing; Phase measurement; Transmission balancing

Indexed keywords

COMPUTER SIMULATION; MATHEMATICAL MODELS; PHASE MEASUREMENT; PHASE SHIFT; PHOTOLITHOGRAPHY;

PHASE BALANCING;

MASKS;

EID: 0035047055     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410714     Document Type: Conference Paper

References (8)

1. Improving resolution with a phase-shifting mask
2. Exposure characteristics of alternate aperture phase-shifting masks fabricated using a subtractive process
3. Pattern-dependent correction of mask topography effects for alternating phase-shifting masks
4. Proximity effects of alternating phase shift masks
5. Transmission & phase balancing of alternating phase shifting masks (5X) - Theoretical & experimental results
6. Rigorous diffraction analysis for future mask technology
7. Optimizing edge topography of alternating phase shifting masks using rigorous mask modeling
8. Sub-quarter micron lithography, with the dual-trench type alternating PSM