Optimization of Alt-PSM structure for 100 nm-node ArF lithography: Part-2

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 396-409

  Mesuda, Kei ^a   Toyama, Nobuhito ^a   Narukawa, Shogo ^a   Morikawa, Yasutaka ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a   Hoga, Morihisa ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

100 nm node ArF lithography; Alternating Phase Shifting Mask; Computer simulation; Mask structure

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; MASKS; OPTICAL PROPERTIES; OPTIMIZATION; PHASE SHIFT;

SIDE-ETCHING;

LITHOGRAPHY;

EID: 0036456468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476981     Document Type: Conference Paper

References (3)

1. S. Murai, et al., "Establishment of Production Process and Assurance Method for Alternating Phase Shift Masks", Proc. of SPIE Vol.4186, 2001.
2. M. Takahashi, et al., "Practical phase control technique for alternating phase shift mask fabrication", Proc. of SPIE Vol.4066, 2000.
3. M.D. Levenson, et al., "Phase Phirst. An improvement strong-PSM paradigm", Proc. of SPIE Vol.4186, 2001.