Evaluation of 3D alternating PSM structures using mask topography simulation and AIMS at λ = 193 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 429-440

  Tabery, Cyrus E ^a   Spence, Christopher A ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

AIMS; ArF MSM; EMF; Image balance; Lithography simulation; Mask topography; OPC; Phase error; Phase shifting mask; PSM

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; IMAGE ANALYSIS; PHASE CONTROL; PHASE SHIFT; PHOTOLITHOGRAPHY; QUARTZ; SURFACE TOPOGRAPHY;

MASK TOPOGRAPHY;

MASKS;

EID: 0035758309     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435743     Document Type: Conference Paper

References (9)

1. Schenker, R., Kirchauer, H., Stivers, A., Tejnil, E. "Alt-PSM for 0.1um and 0.13um poly patterning" Proc. SPIE-Int. Soc. Eng. 2000 [4000-11].
2. McCallum, M., Gordon, R. "Mask topography effects in low k1 lithography." Proc. SPIE-Int. Soc. Eng. 2000, [4000-70].
3. Gordon, R., Flagello, D., McCallum, M. "Deducing aerial image behavior from AIMS data." Proc. SPIE-Int. Soc. Eng. 2000 [4000-74].
4. Gordon, R., Mack, C., Petersen, J. "Design and analysis of manufacturable alternating phase-shifting masks." ." BACUS Symposium on Photomask Technology. September 1998.
5. Wojcik, G., Mould, J., Ferguson, R., Martion, R., Low, K. "Some Image Modeling Issues for Iline, 5X Phase Shifting Masks," Proc. SPIE-Int. Soc. Eng. 1994, 2191, 455-465.
6. Erdmann, A., Friedrich, C. "Rigorous diffraction analysis for furore mask technology," Proc. SPIE-Int. Soc. Eng. 2000, 4000, 684-694.
7. Smith, B. Web site accessed June 1 2000. http://www.rit.edu/̃lvz6961/thinfilms/thinfilms.htm.
8. Friedrich, C., et al. "Optimizing edge topography of alternating phase shifting masks using rigorous mask mdeling." Proc. SPIE-Int. Soc. Eng. 2000 [4000-145].
9. Schellenberg, F., Toublan, O., Cobb, N., Sahouria, E., Hughes, G., MacDonald, S., West, C. "OPC behound 0.18um: OPC on PSM Gates." Proc. SPIE-Int. Soc. Eng. 2000 [4000-114].