Measurements of the critical inclusion size for arcing and macroparticle ejection from aluminum sputtering targets

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2767-2772

  Wickersham, H ^a   Poole, J E ^a   Leybovich, A ^a   Zhu, L ^a  

^a Tosoh SMD Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CATHODES; DIELECTRIC PROPERTIES; DIFFUSION; INCLUSIONS; MATHEMATICAL MODELS; PARTICLE SIZE ANALYSIS; PLASMA SHEATHS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPUTTER DEPOSITION;

MACROPARTICLE EJECTIONS;

THIN FILMS;

EID: 0035508173     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1403719     Document Type: Article

References (19)