Transient charging effects on insulating surfaces exposed to a plasma during pulse biased dc magnetron sputtering

Journal of Applied Physics

Volumn 90, Issue 12, 2001, Pages 5898-5903

  Barnat, Edward V ^a   Lu, T M ^a  

^a Research Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035894264     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1420768     Document Type: Article

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