Simulation of a two-dimensional sheath over a flat wall with an insulator/conductor interface exposed to a high density plasma

Journal of Applied Physics

Volumn 94, Issue 5, 2003, Pages 2852-2857

  Kim, Doosik ^a   Economou, Demetre J ^a  

^a University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CONDUCTORS; ELECTRIC INSULATORS; ELECTRIC POTENTIAL; INTERFACES (MATERIALS); MATHEMATICAL MODELS;

ION FLUX;

PLASMA DENSITY;

EID: 0141857600     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1597943     Document Type: Article

References (12)

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3. D. Kim et al., IEEE Trans. Plasma Sci. (accepted).
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12. 0 = 0, and the potential of the wall.