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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 6, 2001, Pages 2741-2750

Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets

(4) Wickersham, H a Poole, J E a Fan, J S a Zhu, L a

a Tosoh SMD Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHARGE COUPLED DEVICES; DIFFUSION; DOPING (ADDITIVES); IMAGE ANALYSIS; INCLUSIONS; METAL MELTING; PARTICLE SIZE ANALYSIS; PLASMA APPLICATIONS; SPUTTERING; THERMAL EFFECTS;

MACROPARTICLE EMISSIONS;

ELECTRIC ARCS;

EID: 0035509221 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1403718 Document Type: Article

Times cited : (9)

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