Role of inert gas in the low-temperature nano-diamond chemical vapour deposition process

Nanotechnology

Volumn 17, Issue 5, 2006, Pages 1225-1229

  Griffin, Jelani ^a   Ray, Paresh Chandra ^a  

^a JACKSON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; DIAMONDS; MORPHOLOGY; NANOSTRUCTURED MATERIALS;

DIFFERENT MICROSCOPIC TECHNIQUES; NANO-CRYSTALLINE DIAMOND; NUMBER DENSITY;

INERT GASES;

EID: 33144455401     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/17/5/010     Document Type: Article

References (26)

1. Gruen D M, Liu S, Krauss A R and Pan X 1994 J. Appl. Phys. 75 1758
2. Gruen D M, Liu S, Krauss A R, Luo J and Pan X 1994 Appl. Phys. Lett. 64 1502
3. Zhou D, Krauss A R, Quin L C and Gruen D M 1997 J. Appl. Phys. 82 4546
4. Rabeau J R, John P, Wilson J I B and Fan Y 2004 J. Appl. Phys. 96 6724
5. Lombardi G, Hassouni K, Benedic F, Mohasseb F, Ropcke J and Gicquel A 2004 J. Appl. Phys. 96 6739
6. Spitsyn B V, Builov L L and Derjaguin B V 1981 J. Cryst. Growth 52 219
7. Matsumoto S, Sato Y, Kamo M and Setaka N 1980 Gas Discharge Their Appl. Proc. Int. Conf. vol 8 p 452
8. Ashfold M N R, May P W, Rego C A and Everitt N M 1994 Chem. Soc. Rev. 23 21
9. Zalicki P, Ma Y, Zare R N, Wahi E H, Owano T G and Kruger C H 1995 Appl. Phys. Lett. 67 144
10. Petherbridge J R, may P w, Fuge G M, Robertson G F, Rosser K N and Ashfold M N R 2002 J. Appl. Phys. 91 3605
11. Leeds S M, May P W, Ashfold M N R and Rosser K N 1999 Diamond Relat. Mater. 8 226
12. Berrghaus J O, Meunier J-L and Gitzhofer F 1997 IEEE Trans. Plasma Sci. 25 1058
13. Mills R, Sankar J, Ray P C, Dhandapani B and He J 2003 Chem. Mater. 15 1313
14. Mills R, Sankar J, Ray P C, Voigt A, Dhandapani B and He J 2004 J. Mater. Sci. 39 3309
15. Zhou D, McCauley T G, Qin L C, Kraus A R and Gruen D M 1998 J. Appl. Phys. 83 540
16. Gruen D M 1999 Annu. Rev. Mater. Sci. 29 211
17. Yang T S, Lai J Y, Wong M S and Cheng C L 2002 J. Appl. Phys. 92 4912
18. Ye H, Jackman R B and Hing P 2003 J. Appl. Phys. 94 7878
19. Okada K, Kimoto K, Komatsu S and Matsumato S 2003 J. Appl. Phys. 93 3120
20. Vazquez F J G and Albella J M 2003 J. Appl. Phys. 94 6085
21. Xiao X, Birrell J, Gerbi J E, Auciello O and Carlisle A 2004 J. Appl. Phys. 96 2232
22. Mills R, Ray P C, Dhandapani B, Mayo R M and He J 2002 J. Appl. Phys. 92 7008
23. Mills R, Ray P C, Nansteel M, Chen X, Mayo R M, He J and Dhandapani B 2003 IEEE Trans. Plasma Sci. 31 338
24. Vazquez F J G and Albella J M 2002 Plasma Sources Sci. Technol. 11 498
25. Goyette A N, Lawler J E, Anderson L W, Gruen D M, Mccauley T G, Zhou D and Krauss A R 1998 Plasma Sources Sci. Technol. 7 149
26. NIST Atomic References Data www.nist.gov