메뉴 건너뛰기




Volumn 21, Issue 3, 2006, Pages 261-266

A continuous analytic I-V model for long-channel undoped ultra-thin-body silicon-on-insulator (UTB-SOI) MOSFETs from a carrier-based approach

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CARRIER CONCENTRATION; CURRENT VOLTAGE CHARACTERISTICS; MATHEMATICAL MODELS; MOSFET DEVICES; POISSON EQUATION;

EID: 32844468954     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/21/3/008     Document Type: Article
Times cited : (14)

References (20)
  • 2
    • 0036927506 scopus 로고    scopus 로고
    • Experimental study on carrier transport mechanisms in ultrathin body SOI n- and p-MOSFET with SOI thickness less than 5 νm
    • Uchida K, Watanabe H, Kinosshita A, Koga J, Numata T and Takagi S 2002 Experimental study on carrier transport mechanisms in ultrathin body SOI n- and p-MOSFET with SOI thickness less than 5 νm IEDM Tech. Dig. pp 47-50
    • (2002) IEDM Tech. Dig. , pp. 47-50
    • Uchida, K.1    Watanabe, H.2    Kinosshita, A.3    Koga, J.4    Numata, T.5    Takagi, S.6
  • 3
    • 0043175190 scopus 로고    scopus 로고
    • Ultra thin body SiGe-on-insulator pMOSFETs with high-mobility SiGe surface channels
    • Tezuka T, Sugiyama N, Mizuno T and Takagi S 2003 Ultra thin body SiGe-on-insulator pMOSFETs with high-mobility SiGe surface channels IEEE Trans. Electron Devices 50 1328-30
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.5 , pp. 1328-1330
    • Tezuka, T.1    Sugiyama, N.2    Mizuno, T.3    Takagi, S.4
  • 4
    • 0029403828 scopus 로고
    • Electron mobility behavior in extremely thin SOI MOSFETs
    • Choi J H, Park Y J and Min H S 1995 Electron mobility behavior in extremely thin SOI MOSFETs IEEE Electron Device Lett. 16 527-9
    • (1995) IEEE Electron Device Lett. , vol.16 , Issue.11 , pp. 527-529
    • Choi, J.H.1    Park, Y.J.2    Min, H.S.3
  • 5
    • 0347968246 scopus 로고    scopus 로고
    • Physically based modeling of low field electron mobility in ultrathin single- and double-gate SOI n-MOSFETs
    • Esseni D, Abramo A, Selmi L and Sangiorgi E 2003 Physically based modeling of low field electron mobility in ultrathin single- and double-gate SOI n-MOSFETs IEEE Trans. Electron Devices 50 2445-54
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.12 , pp. 2445-2454
    • Esseni, D.1    Abramo, A.2    Selmi, L.3    Sangiorgi, E.4
  • 7
    • 1642373108 scopus 로고    scopus 로고
    • Design guideline of an ultra-thin body SOI MOSFET for low-power and high-performance applications
    • An X, Huang R, Zhao B, Zhang X and Wang Y 2004 Design guideline of an ultra-thin body SOI MOSFET for low-power and high-performance applications Semicond. Sci. Technol. 19 347-50
    • (2004) Semicond. Sci. Technol. , vol.19 , Issue.3 , pp. 347-350
    • An, X.1    Huang, R.2    Zhao, B.3    Zhang, X.4    Wang, Y.5
  • 9
    • 12344291970 scopus 로고    scopus 로고
    • Scaling of lowered source/drain (LSD) and raised source/drain (RSD) ultra-thin body (UTB) SOI MOSFETs
    • An X, Huang R, Zhang X and Wang Y 2005 Scaling of lowered source/drain (LSD) and raised source/drain (RSD) ultra-thin body (UTB) SOI MOSFETs Solid-State Electron. 49 479-83
    • (2005) Solid-State Electron. , vol.49 , Issue.3 , pp. 479-483
    • An, X.1    Huang, R.2    Zhang, X.3    Wang, Y.4
  • 10
    • 10744221153 scopus 로고    scopus 로고
    • Impact of technology parameters on device performance of UTB-SOI CMOS
    • Schulz T et al 2004 Impact of technology parameters on device performance of UTB-SOI CMOS Solid-State Electron. 48 521-7
    • (2004) Solid-State Electron. , vol.48 , Issue.4 , pp. 521-527
    • Schulz, T.1    Al, E.2
  • 12
    • 12444310380 scopus 로고    scopus 로고
    • The nanoscale CMOS: Potential non-classical technologies versus a hypothetical bulk-silicon technology
    • Kim S-H and Fossum J G 2005 The nanoscale CMOS: potential non-classical technologies versus a hypothetical bulk-silicon technology Solid-State Electron. 49 595-605
    • (2005) Solid-State Electron. , vol.49 , Issue.4 , pp. 595-605
    • Kim, S.-H.1    Fossum, J.G.2
  • 14
    • 1342286939 scopus 로고    scopus 로고
    • A continuous analytic drain-current model for DG MOSFETs
    • Taur Y, Liang X, Wang W and Lu H 2004 A continuous analytic drain-current model for DG MOSFETs IEEE Electron Device Lett. 25 107-9
    • (2004) IEEE Electron Device Lett. , vol.25 , Issue.2 , pp. 107-109
    • Taur, Y.1    Liang, X.2    Wang, W.3    Lu, H.4
  • 17
    • 34250743124 scopus 로고    scopus 로고
    • Carrier-based approach: A generous strategy to develop compact model of non-classical CMOS
    • He J, Chan M, Zhang X and Wang Y 2006 Carrier-based approach: a generous strategy to develop compact model of non-classical CMOS IEEE of ICCDCS (Playa del Carmen, Mexico)
    • (2006) IEEE of ICCDCS
    • He, J.1    Chan, M.2    Zhang, X.3    Wang, Y.4
  • 18
    • 43549094423 scopus 로고    scopus 로고
    • Complete carrier-based non-charge-sheet analytic model for nano-scale undoped symmetric double-gate MOSFETs
    • He J, Chan M, Zhang X and Wang Y 2005 Complete carrier-based non-charge-sheet analytic model for nano-scale undoped symmetric double-gate MOSFETs IEEE of EDSSC (Hong Kong) pp 247-52
    • (2005) IEEE of EDSSC , pp. 247-252
    • He, J.1    Chan, M.2    Zhang, X.3    Wang, Y.4
  • 19
    • 49949134400 scopus 로고
    • Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors
    • Pao H C and Sah C T 1966 Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors Solid-State Electron. 9 927-37
    • (1966) Solid-State Electron. , vol.9 , Issue.10 , pp. 927-937
    • Pao, H.C.1    Sah, C.T.2
  • 20
    • 0017932965 scopus 로고
    • A charge sheet model of the MOSFET
    • Brews J R 1978 A charge sheet model of the MOSFET Solid-State Electron. 21 345-52
    • (1978) Solid-State Electron. , vol.21 , Issue.2 , pp. 345-352
    • Brews, J.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.