SCOPUS 정보 검색 플랫폼

Volumn 45, Issue 1-3, 2006, Pages

Growth of silicon nanocrystals by low-temperature photo chemical vapor deposition

Author keywords

Coulomb blockade effect; CV measurement; Photo chemical vapor deposition; Silicon nanocrystals

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

COULOMB BLOCKADE EFFECTS; CV MEASUREMENT; PHOTO CHEMICAL VAPOR DEPOSITION (PHOTO-CVD); SILICON NANOCRYSTALS;

NANOSTRUCTURED MATERIALS;

EID: 32044456262 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.L46 Document Type: Article

Times cited : (3)

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