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Volumn 45, Issue 4-7, 2006, Pages
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Improving high-κ gate dielectric properties by high-pressure water vapor annealing
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Author keywords
High gate oxides; High pressure water vapor annealing; Low temperature annealing
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Indexed keywords
CAPACITANCE;
ELECTRIC PROPERTIES;
HIGH PRESSURE EFFECTS;
LEAKAGE CURRENTS;
VAPORS;
HIGH-Κ GATE OXIDES;
HIGH-PRESSURE WATER VAPOR ANNEALING;
LOW TEMPERATURE ANNEALING;
ANNEALING;
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EID: 32044453342
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.45.L120 Document Type: Article |
Times cited : (14)
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References (11)
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