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Volumn 41, Issue 9 A/B, 2002, Pages
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High-pressure H2O vapor heat treatment used to fabricate poly-Si thin film transistors
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Author keywords
Defect states; Laser crystallization; Mobility; Threshold voltage
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Indexed keywords
CARRIER MOBILITY;
CRYSTAL DEFECTS;
CRYSTALLIZATION;
EXCIMER LASERS;
HEAT TREATMENT;
HIGH PRESSURE EFFECTS;
INTERFACES (MATERIALS);
IRRADIATION;
POLYSILICON;
THRESHOLD VOLTAGE;
LASER CRYSTALLIZATION;
THIN FILM TRANSISTORS;
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EID: 0037107058
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.l974 Document Type: Article |
Times cited : (23)
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References (20)
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