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Volumn 41, Issue 9 A/B, 2002, Pages

High-pressure H2O vapor heat treatment used to fabricate poly-Si thin film transistors

Author keywords

Defect states; Laser crystallization; Mobility; Threshold voltage

Indexed keywords

CARRIER MOBILITY; CRYSTAL DEFECTS; CRYSTALLIZATION; EXCIMER LASERS; HEAT TREATMENT; HIGH PRESSURE EFFECTS; INTERFACES (MATERIALS); IRRADIATION; POLYSILICON; THRESHOLD VOLTAGE;

EID: 0037107058     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l974     Document Type: Article
Times cited : (23)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.