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Volumn 7, Issue 11, 2004, Pages

Nanostructured TaN(O)/TaN barrier film formed by oxygen plasma treatment for copper interconnect

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DIFFUSION; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OXYGEN; PLASMAS; TANTALUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 10044220765     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1805512     Document Type: Article
Times cited : (6)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.