Diffusion of Metals in Silicon Dioxide

Journal of the Electrochemical Society

Volumn 133, Issue 6, 1986, Pages 1242-1246

  McBrayer, J D ^a   Swanson, R M ^a   Sigmon, T W ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE - MATERIALS; METALS AND ALLOYS - DIFFUSION;

ACTIVATION ENERGY; BIAS TEMPERATURE STRESS; SILICON DIOXIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0022738306     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2108827     Document Type: Article

References (19)

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