Double-grating lateral shearing interferometer for extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3718-3721

  Liu, Zhiqiang ^a   Sugisaki, Kasumi ^a   Zhu, Yucong ^a   Ishii, Mikihiko ^a   Murakami, Katsuhiko ^a   Saito, Jun ^a   Suzuki, Akiyosi ^a   Hasegawa, Masanobu ^a  

^a c/o Nikon ^*  (Japan)

Author keywords

At wavelength measurement; Extreme ultraviolet lithograph; Interferometry; Lateral shearing interferometer

Indexed keywords

AT-WAVELENGTH MEASUREMENT; EXTREME ULTRAVIOLET LITHOGRAPHY; LATERAL SHEARING INTERFEROMTERS; POINT DIFFRACTIONS;

CHARGE COUPLED DEVICES; DIFFRACTION GRATINGS; IMAGE SENSORS; INTERFEROMETERS; INTERFEROMETRY; LIGHT SOURCES; WAVEFRONTS;

LITHOGRAPHY;

EID: 4444338912     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3718     Document Type: Conference Paper

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