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Volumn 5374, Issue PART 2, 2004, Pages 797-807
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EUV wavefront metrology system in EUVA
a a a a a b b b c |
Author keywords
At wavelength; EUV; Extreme ultraviolet lithography; Interferometer; Undulator
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Indexed keywords
ABERRATIONS;
COMPUTER SIMULATION;
DIFFRACTION GRATINGS;
ERROR ANALYSIS;
INTERFEROMETERS;
OPTICAL RESOLVING POWER;
ULTRAVIOLET RADIATION;
WAVEFRONTS;
AT-WAVELENGTH;
EUV;
EXTREME ULTRAVIOLET (EUV);
EXTREME ULTRAVIOLET LITHOGRAPGY;
UNDULATORS;
LITHOGRAPHY;
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EID: 3843141563
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.536327 Document Type: Conference Paper |
Times cited : (18)
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References (2)
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