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Volumn 5374, Issue PART 2, 2004, Pages 797-807

EUV wavefront metrology system in EUVA

Author keywords

At wavelength; EUV; Extreme ultraviolet lithography; Interferometer; Undulator

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; DIFFRACTION GRATINGS; ERROR ANALYSIS; INTERFEROMETERS; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION; WAVEFRONTS;

EID: 3843141563     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536327     Document Type: Conference Paper
Times cited : (18)

References (2)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.