Lateral shearing interferometer for EUVL: Theoretical analysis and experiment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 824-832

  Yucong, Zhu ^a   Sugisaki, Katsumi ^a   Ouchi, Chidane ^a   Hasegawa, Masanobu ^a   Niibe, Masahito ^b   Suzuki, Akiyosi ^a   Murakami, Katsuhiko ^a  

^a Wavefront Measurement Lab   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

EUV lithography; Optics; Shearing interferometer; Wavefront measurement

Indexed keywords

ALGORITHMS; CALIBRATION; CHARGE COUPLED DEVICES; ELECTROMAGNETIC WAVE DIFFRACTION; ERROR CORRECTION; INTERFEROMETERS; LASER OPTICS; NATURAL FREQUENCIES; PHASE SHIFT; ULTRAVIOLET RADIATION; WAVEFRONTS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; NUMERICAL APERTURE (NA); SHEARING INTERFEROMETERS; WAVEFRONT MEASUREMENT;

PHOTOLITHOGRAPHY;

EID: 3843133978     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537331     Document Type: Conference Paper

References (5)

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