Shearing interferometry for at wavelength wavefront measurement of extreme-ultraviolet lithography projection optics

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 9 A, 2003, Pages 5844-5847

  Zhu, Yucong ^a   Sugisaki, Katsumi ^a   Murakami, Katsuhiko ^a   Ota, Kazuya ^a   Kondo, Hiroyuki ^a   Ishii, Mikihiko ^a   Kawakami, Jun ^a   Oshino, Tetsuya ^a   Saito, Jun ^a   Suzuki, Akiyoshi ^a   Hasegawa, Masanobu ^a   Sekine, Yoshiyuki ^a   Takeuchi, Seiji ^a   Ouchi, Chidane ^a   Kakuchi, Osamu ^a   Watanabe, Yutaka ^a   Hasegawa, Takayuki ^a   Hara, Shinichi ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

EUVL; Interferometry; Metrology; Phase measurement

Indexed keywords

ALGORITHMS; CHARGE COUPLED DEVICES; INTERFEROMETERS; LIGHT INTERFERENCE; OPTICAL INSTRUMENT LENSES; PHOTOLITHOGRAPHY; WAVEFRONTS;

EXTREME-ULTRAVIOLET LITHOGRAPHY PROJECTION OPTICS; HYPERBOLIC CALIBRATION; LATERAL SHEARING INTERFEROMETER; MULTIPLE-BEAM INTERFERENCE; PHASE-SHIFT ALGORITHM;

INTERFEROMETRY;

EID: 0344925532     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.5844     Document Type: Article

References (4)

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