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Volumn 42, Issue 7 B, 2003, Pages 4856-4860
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Nano-four-point probes on microcantilever system fabricated by focused ion beam
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Author keywords
Cantilever; Focused ion beam; Four point probes; Nanotechnology; Resistivity measurement; Scanning probe microscopy
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRIC CONDUCTIVITY MEASUREMENT;
ELECTRODES;
GRAPHITE;
ION BEAMS;
MICROMACHINING;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
REACTIVE ION ETCHING;
RESISTORS;
SILICON ON INSULATOR TECHNOLOGY;
SURFACE TOPOGRAPHY;
FOCUSED ION BEAM;
MICROCANTILEVER SYSTEM;
NANO FOUR POINT PROBES;
PIEZORESISTORS;
SCANNING PROBE MICROSCOPY;
MICROSCOPIC EXAMINATION;
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EID: 0141680590
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.42.4856 Document Type: Article |
Times cited : (27)
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References (10)
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