Effects of in-situ substrate heating and postdeposition annealing on compositions and electrical properties of tantalum oxide thin films grown by reactive sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 1 A, 2006, Pages 160-164

  Cheng, Hsyi En ^a   Mao, Chien Tang ^a  

^a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Annealing; Composition; Electrical properties; Sputtering; Tantalum oxide

Indexed keywords

ANNEALING; CURRENT DENSITY; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; TANTALUM COMPOUNDS;

DEPOSITION TEMPERATURE; MASS DENSIFICATION; RADIO-FREQUENCY MAGNETRON SPUTTERING; THERMAL POSTDEPOSITION ANNEALING;

THIN FILMS;

EID: 31544479547     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.160     Document Type: Article

References (18)

1. S. Luryi, J. Xu and A. Zasalavsky: Future Trends in Microelectronics (John Wiley & Sons, New York, 1999) p. 15.
2. S. Ezhilvalavan and T. Y. Tseng: J. Mater. Sci.: Mater. Electron. 10 (1999) 9.
3. C. Chaneliere, J. L. Autran, R. A. B. Devine and B. Balland: Mater. Sci. Eng. R 22 (1998) 269.
4. M. Kiyotoshi, K. Hieda, Y. Fukuzumi, Y. Kohyama, T. Suzuki, D. Matsunaga and K. Hashimoto: Jpn. J. Appl. Phys. 42 (2003) 1943.
5. S. P. Garg, N. Krishnamurthy, A. Awasthi and M. Venkatraman: J. Phase Equilib. 17 (1996) 63.
6. M. M. Howard, C. A. Ventrice, Jr., H. Geisler, D. A. Hite and P. T. Sprunger: Mater. Res. Soc. Symp. Proc. 623 (2000) 417.
7. H. Sawada and K. Kawakami: J. Appl. Phys. 86 (1999) 956.
8. C. N. R. Rao and B. Raveau: Transition Metal Oxides (VHC, New York, 1995) p. 200.
9. Y. S. Kim, M. Y. Sung, Y. H. Lee, B. K. Ju and M. H. Oh: J. Electrochem. Soc. 146 (1999) 3398.
10. H.-E. Cheng and C.-T. Mao: Mater. Res. Bull. 38 (2003) 1841.
11. T. Hori: Gate Dielectrics and MOS ULSIs, Principles, Technologies, and Applications (Springer, Berlin, 1997) p. 308.
12. W. K. Choi, L. S. Tan, J. Y. Lim and S. G. Pek: Thin Solid Films 343-344 (1999) 105.
13. A. Paskaleva, E. Atanassova and T. Dimitrova: Vacuum 58 (2000) 470.
14. C. P. Smyth: Dielectric: Behaviour and Structure (McGraw-Hill, New York, 1955) p. 7.
15. S. Ezhivalavan and T.-Y. Tseng: Thin Solid Films 360 (2000) 268.
16. D. Cappus, C. Xu, D. Ehrlich, B. Dillmann, C. A. Ventrice, Jr., K. Al. Shamery, H. Kuhlenbeck and H.-J. Freund: Chem. Phys. 177 (1993) 533.
17. H.-J. Freund, D. Cappus, M. Hassel, E. Neuhaus, M. Heber and F. Rohr: Surf. Sci. 337 (1995) 268.
18. N. Terao: Jpn. J. Appl. Phys. 6 (1967) 21.