Electrical properties of Ta2O5 thin films deposited on Cu

Thin Solid Films

Volumn 360, Issue 1-2, 2000, Pages 268-273

  Ezhilvalavan, S ^a   Tseng, Tseung Yuen ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTALLIZATION; DIELECTRIC PROPERTIES OF SOLIDS; DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC FIELD MEASUREMENT; ELECTRIC PROPERTIES; ELECTRODES; LEAKAGE CURRENTS; MIM DEVICES; RAPID THERMAL ANNEALING; SPUTTER DEPOSITION; TANTALUM COMPOUNDS;

DIELECTRIC BREAKDOWN; LEAKAGE CURRENT DENSITY; OHMIC CONDUCTION; SCHOTTKY MECHANISM; TANTALUM OXIDES;

THIN FILMS;

EID: 0034140915     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00873-1     Document Type: Article

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