Morphological stability of Si(001) surface immersed in fluid mixture of ultrapure water and silica powder particles in elastic emission machining

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 8, 2005, Pages 5893-5897

  Kubota, Akihisa ^a   Mimura, Hidekazu ^a   Inagaki, Kouji ^a   Yumoto, Hirokatsu ^a   Mori, Yuzo ^a   Yamauchi, Kazuto ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy (AFM); Elastic emission machining (EEM); Si(001) surface; Silica powder particles; Surface etching; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTICITY; ETCHING; MIXTURES; MORPHOLOGY;

ELASTIC EMISSION MACHINING (EEM); SI SUBSTRATE; SILICA POWDER PARTICLES; SURFACE ETCHING;

SILICON;

EID: 31544466803     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5893     Document Type: Article

References (17)

1. Y. Mori, K. Yamauchi and K. Endo: Precis. Eng. 9 (1987) 123.
2. Y. Mori, K. Yamauchi and K. Endo: Precis. Eng. 10 (1988) 24.
3. Y. Mori, K. Yamauchi, K. Endo, T. Ide, H. Toyota, K. Nishizawa and M. Hasegawa: J. Vac. Sci. Technol. A 8 (1990) 621.
4. K. Yamauchi, H. Mimura, K. Inagaki and Y. Mori: Rev. Sci. Instrum. 73 (2002) 4028.
5. K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa and Y. Mori: J. Synchrotron Radiat. 9 (2002) 313.
6. K. Yamauchi, K. Yamamura, H. Mimura, Y. Sano, A. Saito, K. Endo, A. Souvorov, M. Yabashi, K. Tamasaku, T. Ishikawa and Y. Mori: Jpn. J. Appl. Phys. 42 (2003) 7129.
7. H. Mimura, K. Yamauchi, K. Yamamura, A. Kubota, S. Matsuyama, Y. Sano, K. Ueno, K. Endo, Y. Nishino, K. Tamasaku, M. Yabashi, T. Ishikawa and Y. Mori: J. Synchrotron Radiat. 11 (2004) 343.
8. Y. Mori, K. Yamauchi, K. Yamamura, H. Mimura, A. Saito, H. Kishimoto, Y. Sekito, M. Kanaoka, A. Souvorov, M. Yabashi, K. Tamasaku and T. Ishikawa: Proc. SPIE 4501 (2001) 30.
9. H. Kanaya, K. Usuda and K. Yamada: Appl. Phys. Lett. 67 (1995) 682.
10. K. Usuda and K. Yamada: Appl. Surf. Sci. 143 (1999) 16.
11. K. Usuda and K. Yamada: J. Electrochem. Soc. 144 (1997) 3204.
12. K. Usuda, H. Kanaya, K. Yamada, T. Sato, T. Sueyoshi and M. Iwatsuki: Appl. Phys. Lett. 64 (1994) 3240.
13. T. Ohmi: J. Electrochem. Soc. 143 (1996) 2957.
14. M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami and M. Ohwada: J. Appl. Phys. 68 (1990) 1272.
15. K. Arima, K. Endo, T. Kataoka, Y. Oshikane, H. Inoue and Y. Mori: Surf. Sci. 446 (2000) 128.
16. K. Arima, K. Endo, T. Kataoka, Y. Oshikane, H. Inoue and Y. Mori: Appl. Phys. Lett. 76 (2000) 463.
17. K. Endo, K. Arima, K. Hirose, T. Kataoka and Y. Mori: J. Appl. Phys. 91 (2002) 4065.