Resist-based measurement of the contrast transfer function in a 0.3-NA EUV microfield optic

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 741-748

  Cain, Jason P ^a,c   Naulleau, Patrick ^b   Spanos, Costas J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

Aerial image contrast; Contrast transfer function (CTF); Extreme ultraviolet (EUV) lithography; Microexposure tool (MET) optic; Synchrotron

Indexed keywords

AERIAL IMAGE CONTRAST; CONTRAST TRANSFER FUNCTION (CTF); EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MICROEXPOSURE TOOL (MET) OPTIC;

INTERFEROMETRY; MASKS; OPTICAL RESOLVING POWER; SYNCHROTRONS; TRANSFER FUNCTIONS; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 24644511149     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600427     Document Type: Conference Paper

References (10)

1. P. Naulleau, K. A. Goldberg, E. Anderson, K. Bradley, R. Delano, P. Denham, B. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, J. Taylor, "Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic," in Emerging Lithographic Technologies VIII, R. Scott Mackay, ed., Proc. SPIE 5374, pp. 881-891, 2004.
2. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, P. Denham, K. Jackson, A.-S. Morlens, S. Rekawa, F. Salmassi, "Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic," J. Vac. Sci. Tech. B, 22(6), pp. 2962-2965, Nov./Dec. 2004.
3. P. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. P. Cain, P. Denham, B. Hoef, K. Jackson, A. Morlens, S. Rekawa, "EUV microexposures at the ALS using the 0.3-NA MET projection optics," in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005.
4. P. P. Naulleau, K. A. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, "Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography," Applied Optics 42, pp. 820-826, February 2003.
5. S. H. Lee, D. A. Tichenor, and P. Naulleau, "Lithographic aerial-image contrast measurement in the extreme ultraviolet Engineering Test Stand," J. Vac. Sci. Technol. B, 20(6), pp. 2849-2852, Nov./Dec. 2002.
6. A. Grassman and H. Moritz, "Contrast transfer function measurements of deep ultraviolet steppers," J. Vac. Sci. Technol. B 10(6), pp. 3008-3011, Nov./Dec. 1992.
7. J. A. Hoffnagle, W. D. Hinsberg, M. I. Sanchez, and F. A. Houle, "Method of measuring the spatial resolution of a photoresist," Optics Letters 27, pp. 1776-1778, 15 October 2002.
8. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, "EUV interferometric testing and alignment of the 0.3 NA MET optic," in Emerging Lithographic Technologies VIII, R. Scott Mackay, ed., Proc. SPIE 5374, pp. 64-73, 2004.
9. G. M. Wallraff, D. R. Medeiros, M. Sanchez, K. Petrillo, W. Huang, C. Rettner, B. Davis, C. E. Larson, L. Sundberg, P. J. Brock, W. D. Hinsberg, F. A. Houle, J. A. Hoffnagle, D. Goldfarb, K. Temple, S. Wind, and J. Bucchignano, "Sub-50 nm half-pitch imaging with a low activation energy chemically amplifed photoresist," J. Vac. Sci. Technol. B 22(6), pp. 3479-3484, Nov./Dec. 2004.
10. J. P. Cain, P. Naulleau, C. J. Spanos, "Modeling of EUV photoresists using resist point spread function," in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005.