Microstructure and dielectric properties of sputtered (Ba 0.3Sr0.7)TiO3 thin films with amorphous interfacial layers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 A, 2005, Pages 5049-5054

  Lin, Tai Nan ^a   Chu, Jinn P ^a   Wang, Sea Fue ^b   Wu, Cheng Hui ^a  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Activation energy; Amorphous phase; Barium strontium titanate; Crystallization; Sputtering

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS MATERIALS; CRYSTALLIZATION; DIELECTRIC MATERIALS; MICROSTRUCTURE; PERMITTIVITY; SPUTTERING;

AMORPHOUS PHASE; BARIUM STRONTIUM TITANATE; FIRST-ORDER TRANSITION;

THIN FILMS;

EID: 31544440139     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5049     Document Type: Article

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