Electrical and microstructural degradation with decreasing thickness of (Ba, Sr)TiO3 thin films deposited by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 11, 1996, Pages 5757-5762

  Paek, Su Hyon ^a   Won, Jinhee ^a   Lee, Kong Soo ^a   Choi, Jin Seog ^b   Park, Chi Sun ^c  

^a Hanyang University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Hanseo University   (South Korea)

Author keywords

(Ba, Sr)TiO3; Dielectric constant; HRTEM; Interfacial layer; Leakage current; RF magnetron sputtering

Indexed keywords

ELECTRICAL DEGRADATION; INTERFACIAL LAYER;

CAPACITANCE MEASUREMENT; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); LEAKAGE CURRENTS; MAGNETRON SPUTTERING; MORPHOLOGY; PERMITTIVITY; SUBSTRATES; TITANIUM OXIDES;

THIN FILMS;

EID: 0030284527     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.5757     Document Type: Article

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