Microstructure of (Ba, Sr)TiO3 thin films deposited by physical vapor deposition at 480 °C and its influence on the dielectric properties

Applied Physics Letters

Volumn 77, Issue 8, 2000, Pages 1209-1211

  Werner, Matthew C ^a,b   Banerjee, Indrajit ^a   McIntyre, Paul C ^b   Tani, Noriaki ^c   Tanimura, Michio ^c  

^a INTEL CORPORATION   (United States)

^b Stanford University   (United States)

^c ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000355284     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1288155     Document Type: Article

References (11)

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