Ba0.5Sr0.5TiO3 thin films deposited by PLD on SiO2/Si RuO2/Si and Pt/Si electrodes

Thin Solid Films

Volumn 373, Issue 1-2, 2000, Pages 49-52

  Lopez L L ^a   Portelles, J ^a   Siqueiros, J M ^a   Hirata, G A ^b   McKittrick, J ^b  

^a CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA   (Mexico)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM TITANATE; CRACKS; CRYSTALLIZATION; DEPOSITION; LASER ABLATION; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; STOICHIOMETRY; THERMAL EXPANSION; THIN FILMS;

BARIUM STRONTIUM TITANATE; THERMAL EXPANSION COEFFICIENT; THERMAL EXPANSION MISMATCH;

DIELECTRIC FILMS;

EID: 0342973139     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01105-6     Document Type: Article

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