Thermochemical stability of IrO2 bottom electrodes in direct-liquid-injection metalorganic chemical vapor deposition of Pb(Zr,Ti)O3 films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2655-2660

  Byun, Kyung Mun ^a   Lee, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Direct liquid Injection; Electrode; Film; FRAM; IrO2; MOCVD; PZT

Indexed keywords

DISSOCIATION; ELECTRODES; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RANDOM ACCESS STORAGE; REDUCTION; THERMODYNAMIC STABILITY;

DIRECT LIQUID INJECTION; FERROELECTRIC RANDOM ACCESS MEMORIES (FRAM); FRAM; THERMOCHEMICAL STABILITY;

CONDUCTIVE FILMS;

EID: 3142750604     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2655     Document Type: Article

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