Stability of reactive DC-sputtered Ir and IrO2 thin films in various ambients

Integrated Ferroelectrics

Volumn 16, Issue 1-4, 1997, Pages 191-198

  Chen, Tung Sheng ^a   Balu, Venkatasubramani ^a   Jiang, Bo ^a   Kuah, Shao Hong ^a   Lee, Jack C ^a   Chu, Peir ^b   Jones, Robert E ^b   Zurcher, Peter ^b   Taylor, Deborah J ^b   Gillespie, Sherry ^b  

^a The University of Texas at Austin   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; COMPOSITION; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; IRIDIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; SPUTTER DEPOSITION; THIN FILMS;

IRIDIUM OXIDES;

DIELECTRIC FILMS;

EID: 0031351319     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708013041     Document Type: Article

References (8)

1. K. Sreenivas, Journal of Applied Physics, 75, (1), p. 232 (1994).
2. P. Y. Chu, Journal of Material Research, in press (1996).
3. Q. X. Rao, Journal of Material Research, 9, No. 10, p. 2561 (1994).
4. H. N. Al-Shareef, Journal of Applied Physics, 77(5), p. 2146 (1995)
5. Shinji Saito, Japanese Journal of Applied Physics, 31, Pt. 1, No. 1, p. 135 (1992).
6. Wei Pan, Journal of Material Research, 9, No. 11, p. 2976 (1994).
7. C. N. R. Rao, National Bureau of Standards Report, No. NSDRS-NBS 49 (1974).
8. Philip D. Hren, in Proceedings of the 3rd ISIF, p. 612 (1991).