Reversible crystallization of a-Si1-xGex alloys under the combined effect of light and temperature

Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 155-163

  Martin, P ^a   Torres, A ^a   Jimenez J ^a   Rodriguez A ^b   Sangrador, J ^b   Rodriguez T ^b  

^a UNIVERSIDAD DE VALLADOLID   (Spain)

^b UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN BOUNDARIES; LIGHTING; NUCLEATION; OPTICAL PROPERTIES; PARAMETER ESTIMATION; PHOTONS; RAMAN SCATTERING; THIN FILM TRANSISTORS;

METASTABLE EFFECTS; OPTICAL RADIATION; SOLID PHASE CRYSTALLIZATION (SPC); STRUCTURAL TRANSFORMATION;

SILICON ALLOYS;

EID: 3142689052     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1755855     Document Type: Article

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