Formation of nanocrystallites governed by the initial stress in the ultrathin hydrogenated amorphous silicon films

Journal of Applied Physics

Volumn 90, Issue 2, 2001, Pages 1067-1069

  Hazra, Sukti ^a,b   Sakata, Isao ^a   Yamanaka, Mitsuyuki ^a   Suzuki, Eiichi ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035878838     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1377299     Document Type: Article

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