Reactive magnetron sputtering of hard Si-B-C-N films with a high-temperature oxidation resistance

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 6, 2005, Pages 1513-1522

  Vlček, Jaroslav ^a   Potocký, Štěpán ^a   Čížek, Jiří ^a   Houška, Jiří ^a   Kormunda, Martin ^a   Zeman, Petr ^a   Peřina, Vratislav ^b   Zemek, Josef ^c   Setsuhara, Yuichi ^d   Konuma, Seiji ^e  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^c INSTITUTE OF PHYSICS   (Czech Republic)

^d OSAKA UNIVERSITY   (Japan)

^e Kanagawa High Technology Foundation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CARBON; COMPRESSIVE STRESS; HIGH TEMPERATURE APPLICATIONS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NITROGEN; OXIDATION; SURFACE CHEMISTRY; THIN FILMS;

IONS BOMBARDING; REACTIVE MAGNETRON SPUTTERING; SURFACE BONDING STRUCTURE;

SILICON;

EID: 31044453955     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2049298     Document Type: Article

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