Macro/microcavity method and its application in modeling chemical vapor deposition reaction systems

Thin Solid Films

Volumn 365, Issue 2, 2000, Pages 176-188

  Hong, Lu Sheng ^a   Shimogaki, Yukihiro ^b   Komjyama, Hiroshi ^b  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ETCHING; FILM GROWTH; MATHEMATICAL MODELS; MONTE CARLO METHODS; PROBABILITY;

MACRO/MICROCAVITY METHOD (MMC);

SEMICONDUCTING FILMS;

EID: 0033734592     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01058-5     Document Type: Article

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