Chemical passivation of TiN underlayer as anti-oxidation barrier for enhancing the nucleation of CVD-Al

Advanced Metallization Conference (AMC)

Volumn , Issue , 2000, Pages 679-683

  Iino, T ^a   Sugiyama, M ^a   Itoh, H ^a   Aoyama, J ^a   Komiyama, H ^a   Shimogaki, Y ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; NUCLEATION; OXIDATION; PASSIVATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE REFLECTIVITY MEASUREMENTS;

TITANIUM NITRIDE;

EID: 0034461767     PISSN: 10480854     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)