Investigation of thin Al layer growth with in situ infrared spectroscopic ellipsometry

Thin Solid Films

Volumn 318, Issue 1-2, 1998, Pages 124-127

  Hausmann, A ^a   Weidner, G ^a   Weidner, M ^a   Ritter, G ^a  

^a IHP   (Germany)

Author keywords

Dimethylaluminiumhydride; Metallorganic; Tetrakisdimethylaminotitanium

Indexed keywords

ELLIPSOMETRY; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEATION; SEMICONDUCTOR GROWTH; SURFACE STRUCTURE;

DIMETHYLALUMINIUMHYDRIDE (DMAH); INFRARED SPECTROSCOPIC ELLIPSOMETER (IREL); TETRAKISDIMETHYLAMINOTITANIUM (TDMAT);

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0032050928     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01150-4     Document Type: Article

References (5)

1. K. Sugai, H. Okabayashi, A. Kobayashi, T. Yako, S. Kishida, Jpn. J. Appl. Phys. 34 (1995) LA29-LA32.
2. A. Canillas, E. Pascual, B. Drevillon, Thin Solid Films 234 (1993) 318-322.
3. K. Tsubouchi, K. Masu, N. Shigeeda, T. Matano, Y. Hiura, N. Mikoshiba, Appl. Phys. Lett. 57 (1990) 1221-1223.
4. K. Sugai, H. Okabayashi, T. Shinzawa, S. Kishida, A. Kobayashi, T. Yako, H. Kadokura, J. Vac. Sci. Technol. B 13 (1995) 2115-2118.
5. I. Iacoponi, D. Liao, M. Danek, K. Littau, D. Saigal, M. Eizenberg, R. Mosely, Mater. Res. Soc. Conf. Proc. ULSI XI (1996) 375-379.