On the Incorporation of Carbon in SiO2 layers

Defect and Diffusion Forum

Volumn 160-161, Issue , 1998, Pages 1-24

  Garrido, B ^a   Bonafos, C ^a   Lopez M ^a   Cuadras, A ^a   Perez Rodriguez A ^a   Pressel, K ^b   Morante, J R ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b IHP   (Germany)

Author keywords

Carbon diffusion; Ion implantation; Luminescence; Oxidation; Si1 yCy

Indexed keywords

EID: 3042958679     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.160-161.1     Document Type: Article

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