Diffusion and segregation of carbon in SiO2 films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 3 SUPPL. B, 1997, Pages 1465-1468

  Mizushima, Ichiro ^a   Kamiya, Eiji ^a   Arai, Norihisa ^a   Sonoda, Masahisa ^a   Yoshiki, Masahiko ^a   Takagi, Shin Ichi ^a   Wakamiya, Mikio ^a   Kambayashi, Shigeru ^a   Mikata, Yuichi ^a   Mori, Sei Ichi ^a   Kashiwagi, Masahiro ^a,b  

^a TOSHIBA CORPORATION   (Japan)

^b Applied Materials Japan Inc   (Japan)

Author keywords

BPSG; Carbon; Fixed charge; Segregation; Silicon

Indexed keywords

EID: 0001694464     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.1465     Document Type: Article

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