Block copolymer thermoplastic elastomers for microcontact printing

Langmuir

Volumn 19, Issue 26, 2003, Pages 10957-10961

  Trimbach, David ^a   Feldman, Kirill ^b   Spencer, Nicholas D ^b   Broer, Dirk J ^a,c   Bastiaansen, C W M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ETH ZURICH   (Switzerland)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ETCHING; GOLD; INK; MONOLAYERS; SILICONES; STIFFNESS; SUBSTRATES; THERMOPLASTIC ELASTOMERS;

ETCH RESIST; MICROCONTACT PRINTING; POLYDIMETHYLSILOXANE; SELF-ASSEMBLED MONOLAYER; THIOL INK;

BLOCK COPOLYMERS;

EID: 0347567043     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la035214j     Document Type: Article

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