Excimer lamps: History, discharge physics, and industrial applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5483, Issue , 2004, Pages 272-286

  Kogelschatz, Ulrich ^a,b  

^a ABB CORPORATE RESEARCH   (Switzerland)

^b NONE   (Switzerland)

Author keywords

Advanced oxidation process (AOP); Dielectric barrier discharge; Excilamp; Excimer lamp; Glow discharge; Low temperature photo processing; Ultraviolet radiation

Indexed keywords

DISCHARGE LAMPS; ELECTRON ENERGY LEVELS; ETCHING; FLUORESCENCE; GLOW DISCHARGES; LOW TEMPERATURE EFFECTS; PHOSPHORS; ULTRAVIOLET RADIATION; VACUUM;

ADVANCED OXIDATION PROCESS (AOP); DIELECTRIC-BARRIER DISCHARGES; EXCILAMPS; EXCIMER LAMPS; LOW-TEMPERATURE PHOTO-PROCESSING;

EXCIMER LASERS;

EID: 3042645649     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.563006     Document Type: Conference Paper

References (135)

1. W. E. Curtis, "A new band spectrum associated with helium", Proc. Roy. Soc. London, Ser. A 89, 146-149, 1913
2. F. Goldstein, Über ein noch nicht beschriebenes, anscheinend dem Helium angehörendes Spektrum," Verh. Deutsche Phys. Ges. 15, 402-413, 1913
3. J. J. Hopfield, "New ultra-violet spectrum of helium", Astrophys. J. 72, 133-145, 1930
4. B. Stevens and E. Hutton, "Radiative life-time of the pyrene dimer and the possible role of excited dimers in energy transfer processes", Nature 186, 4730, 1045-1046, 1960
5. N. G. Basov, V. A. Danilychev, Yu. M. Popov and D. D. Khodkevich, "Laser operating in the vacuum region of the spectrum by excitation of liquid xenon with an electron beam", JETP Lett. 12, 329-331, 1970
6. Ch. K. Rhodes, "Review of ultraviolet laser physics", IEEE J. Quantum Electron. 10, 153-174, 1974
7. Ch. K. Rhodes, Ed., Excimer Lasers, Springer, New York, 1979, 1984
8. S. Watanabe and H. Kashiwagi, "Excimer lasers", Oyo Buturi (Japan) 46, 978-995, 1977 (in Japanes)
9. I. S. Lakoba and S. I. Yakovlenko, "Active media of exciplex lasers (review)", Sov. J. Quantum. Electron, 10, 389-410, 1980
10. B. M. Smimov, "Excimer molecules", Sov. Phys. Usp. 26, 31-45, 1983
11. 2 * at low pressures as a vacuum ultraviolet source", J. Appl. Phys. 64, 1679-1690, 1988
12. 2* at low pressures as a vacuum ultraviolet source", J. Appl. Phys. 64, 1691-1695, 1988
13. Y. Tanaka and M. Zelikoff, "The continuous emission spectra of Kr and Xe in the vacuum ultraviolet region", Phys. Rev. 93, 933, 1954
14. Y. Tanaka and M. Zelikoff, "Continuous emission spectrum of xenon in the vacuum ultraviolet region", J. Opt. Soc. Am. 44, 254-255, 1954
15. Y. Tanaka, "Continuous emission spectra of rare gases in the vacuum ultraviolet region," J. Opt. Soc. Am. 45, 710-713, 1955
16. G. A. Volkova, N. N. Kirillova, E. N. Pavlovskaya and A.V. Yakovleva, "Vacuum-ultraviolet lamps with a barrier discharge in inert gases", J. Appl. Spectrosc. 41, 1194-1197, 1984
17. V. S. Shevera, A. K. Shuaibov, A. N. Malinin and S. Yu. Gerts, "Investigation of the efficiency of the formation of monohalides of inert gases in pulsed discharge through a dielectric", Opt. Spectrosc. (USSR) 49, 662-663, 1980
18. A. N. Malinin, A. K. Shuaibov, and V. S. Shevera, "Excitation of a mixture of mercury vapor and halogen-containing molecules in a pulsed discharge through a dielectric", J. Appl. Spectrosc. 32, 313-316, 1980
19. I. W. Boyd and J.-Y. Zhang, "New large area ultraviolet lamp sources and their applications", NIM B121, 349-356, 1997 (Nucl. Instrum. Methods in Phys. Res. B: Beam Interactions with Materials & Atoms)
20. I. W. Boyd, J.-Y. Zhang and U. Kogelschatz, "Development and applications of UV excimer lamps", Photo-Excited Processes, Diagnostics and Applications, A. Peled, Ed., 161-199, Kluwer Academic, The Netherlands, 2003
21. U. Kogelschatz, H. Esrom, J.-Y. Zhang and I.W. Boyd, "High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing", Appl. Surf. Sci. 168, 29-36, 2000
22. V. F. Tarasenko, "Excilamps as efficient UV-VUV light sources", Pure Appl. Chem. 74, 465-469, 2002
23. M. I. Lomaev, V. S. Skakun, E. A. Sosnin, V. F. Tarasenko, D. V. Shirts and M. V. Erofeev "Excilamps: efficient sources of spontaneous UV and VUV radiation", Phys.-Uspheki 46(2003), No. 2, 2003 (in print)
24. B. Eliasson and U. Kogelschatz, "UV excimer radiation from dielectric barrier discharges", Appl. Phys. B. 46, 299-303, 1988
25. B. Eliasson and U. Kogelschatz, "Modeling and applications of silent discharge plasmas" IEEE Trans. Plasma Sci. 19, 309-323, 1991
26. A. P. Gochelashvili, A. V. Dem'yanov, J. V. Kochetov and L. R. Yangurazova, "Theory of excimer lamps pumped by self-sustained discharges", Laser Phys. 3, 140-145, 1993
27. V. V. Ivanov, K. S. Klopovskii, Yu. A. Mankelevich, A. T. Rakhimov, T. V. Rakhimova, G. B. Rulev and V. B. Saenko, "Experimental and theoretical study of the efficiency of an excimer lamp pumped by a pulse distributed discharge in xenon", Laser Phys. 6, 654-659, 1996
28. F. Vollkommer and L. Hitzschke, "Dielectric barrier discharge", Proc. 8th International Symposium on the Science & Technology of Light Sources (LS-8), G. Babucke, Ed., 51-60, Greifswald, 1998
29. A. Oda, H. Sugarawa, Y. Sakai and H. Akashi, "Estimation of the light output power and efficiency of Xe barrier discharge using a one-dimensional fluid model for various voltage forms", J. Phys. D: Appl. Phys. 33, 1507-1513, 2000
30. A. M. Boichenko, S. I. Yakovlenko and V. F. Tarasenko, "Electron beam-excited Xe exilamp's optimal characteristics", Laser and Particle Beams 18, 655-660, 2000
31. R. J. Carman and R. P. Mildren, "Computer modelling of a short-pulse excited dielectric barrier discharge xenon excimer lamp (λ ∼ 172 nm)", J. Phys. D: Appl.Phys. 36, 1-33, 2003
32. 2 ternary mixtures excited by glow discharge", Laser Phys. 13, 10, in print, 2003
33. 2 lamp kinetics upon capacitive discharge excitation", Laser Phys. 13, 10, in print, 2003
34. A. N. Tkachev, and S. I. Yakovlenko, "Breakdown in a cylindrical gap of an effective excimer lamp with a small-curvature-radius cathode", Laser Phys. 13, 9, in print, 2003
35. A. N. Tkachev, and S. I. Yakovlenko, "Simulation of the plasma creation in a cathode layer of the high-efficiency excilamp discharge", Laser Phys. 12, 1022-1028, 2002
36. B. Gellert and U. Kogelschatz "Generation of excimer emission in dielectric barrier discharges", Appl. Phys. B. 52, 14-21, 1991
37. U. Kogelschatz, "Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation", Pure Appl. Chem. 62, 1667-1674, 1990
38. U. Kogelschatz, B. Eliasson and H. Esrom, "Industrial applications of excimer ultraviolet sources", Materials & Design 12, 251-258, 1991
39. U. Kogelschatz, "Silent-Discharge Driven Excimer UV Sources and their Applications", Appl. Surf. Sci. 54, 410-423, 1992
40. L. A. Moore and C. M. Smith, "Properties of fused silica for 157nm photomasks", Proc. SPIE 3873, 392-401, 1999
41. T. Urakabe, S. Harada, T. Saikatsu and M. Karino, "A flat fluorescent lamp with Xe dielectric barrier discharges", J. Light Vis. Env. 20, 20-25, 1996
42. J.-Y. Zhang and I. W. Boyd, "Lifetime investigation of excimer UV sources", Appl. Surf. Sci. 168, 296-299, 2000
43. K. Stockwald and M. Neiger, "Some properties of a novel far UV xenon excimer barrier discharge light source", Contrib. Plasma Phys. 35, 15-22, 1995
44. J.-Y. Zhang and I. W. Boyd, "Efficient excimer ultraviolet sources from a dielectric barrier discharge in rare-gas/halogen mixtures", J. Appl. Phys. 80, 633-638, 1996
45. J.-Y. Zhang and I. W. Boyd, "Efficient Xel* excimer ultraviolet sources from a dielectric barrier discharge", J. Appl. Phys. 84, 1174-1178, 1998
46. V. F. Tarasenko, M. I. Lomaev, D. V. Shitz, and V. S. Skakun, "High-power excilamps pumped by a barrier discharge", Proc. SPIE 4760, 714-722, 2002
47. Z. Falkenstein and J. J. Coogan, "The development of a silent discharge-driven XeBr* excimer UV light source", J. Phys. D.: Appl. Phys. 30, 2704-2710, 1997
48. U. Kogelschatz, "Filamentary, patterned, and diffuse barrier discharges", IEEE Trans. Plasma Sci. 30, 1400-1408, 2002
49. D. Lindau and H. F. Doebele, "The constricted glow discharge: A stationary source of vacuum-UV rare-gas excimer continua", Rec. Sci. Instrum. 59, 565-568, 1988
50. R. S. Taylor, K. E. Leopold and K. O. Tan, "Continuous B → X excimer fluorescence using direct current discharge excitation", Appl. Phys. Lett. 59, 525-527, 1991
51. A. P. Golovitzkii, "The possibility of developing efficient ultraviolet emitters based on a cw glow discharge in mixtures of inert gases and halogens", Sov. Phys. Tech. Phys. Lett. 18, 269-270, 1992
52. A. P. Golovitzkii and S. N. Kan, "Characteristics of UV excimer radiation from a continuous low-pressure glow discharge", Opt. Spectrosc. 75, 357-360, 1993
53. A. Schwabedissen and W. Bötticher, "UV radiation from low pressure XeCl* and KrCl* glow discharges", Contrib. Plasma Phys. 35, 517-535, 1995
54. K. Tiedke, A. Schwabedissen, G. Schröder and W. Bötticher, "Gas density distribution and reduced field strenghths of the positive column of low pressure XeCl* glow discharges", Contrib. Plasma Phys. 35, 537-550, 1995
55. 2 (HCl) mixtures pumped by a glow discharge", Laser Phys. 5, 1112-1115, 1995
56. M. I. Lomaev, A. N. Panchenko, V. S. Skakun, E. A. Sosnin, V. F. Tarasenko, M. G. Adamson, B. R. Myers and F. T. Wang, "Excilamp producing up to 130 W of output power and possibility of its application", Laser and Particle Beams 15, 339-345, 1997
57. V. S. Skakun, M. I. Lomaev, V. F. Tarasenko, D. V. Shitts, G. L. Johnson and F. T. Wang, "High-power UV excilamps excited by a glow discharge", Laser Particle Beams 21, 115-119, 2003
58. P. G. Wilkinson and Y. Tanaka, "New xenon-light source for the vacuum ultraviolet", J. Opt. Soc. Am. 45, 344-349, 1955
59. P. G. Wilkinson and E. T. Byram, "Rare gas light sources for the vacuum ultraviolet", Appl. Opt. 4, 581-588, 1965
60. O. A. Zakharenko, A. A. Kuznetsov, V. N. Slinko, and S. S. Sulakshin, "Experimental investigation of vacuum ultraviolet emission from Kr and Xe rare gases in a high-power high-pressure pulsed microwave discharge", Sov. J. Quantum Electron. 20, 813-815, 1990
61. J. D. Ametepe, J. Diggs, D. M. Manos and M. J. Kelley, "Characterization and modeling of a microwave driven xenon excimer lamp", J. Appl. Phys. 85, 7005-7010, 1999
62. 2 lamp and its applications", Reza Kenkyu Rev. Laser Eng. (Japan) 19, 1073-1081, 1991
63. 2 excimer lamp (157 nm) excited by microwave discharge", Appl. Phys. Lett. 59, 387-389, 1991
64. H. Kumagai and M. Obara, "New high-efficiency quasi-continuous operation of an ArF(B-X) excimer lamp excited by microwave discharge", Appl. Phys. Lett. 55, 1583-1584, 1989
65. H. Kumagai and M. Obara, "New high-efficieny quasi-continuous operation of a KrF(B-X) excimer lamp excited by microwave discharge", Appl. Phys. Lett. 54, 2619-2621, 1989
66. 2", Can. J. Phys. 69, 699-701, 1991
67. 2", Can. J. Phys. 69, 699-701, 1991
68. M. Kitamura, K. Mitsuka and H. Sato, "A practical high-power excimer lamp excited by a microwave discharge", Appl. Surf. Sci. 79/80, 507-513, 1994
69. nd Microwave Power Symposium, 60-63, International Microwave Power Institute, Ottawa, 1997
70. H. Furusawa, S. Okada and M. Obara, "High-efficiency continuous operation HgBr excimer lamp excited by microwave discharge", Appl. Phys. Lett. 66, 1877-1879, 1995
71. R. E. Huffman, J. C. Larrabee and D. Chambers, "New excitation unit for rare gas continua in the vacuum ultraviolet", Appl. Opt. 4, 1145-1150, 1965
72. 2* excimer emission from multi-atmosphere discharges in Kr, Kr-He and Kr-Ne mixtures", J. Phys. D: Appl. Phys. 20, 709-713, 1987
73. J. Kawanaka, T. Shirai, S. Kubodera and W. Sasaki, "1.5-kW high peak power and 140-ns short-pulse krypton excimer lamp using a pulsed silent discharge", Proc. SPIE 3574, 466-469, 1998
74. T. Gerber, W. Lüthy and P. Burkhardt, "High efficiency KrF excimer flash lamp", Opt. Comm. 35, 242-244, 1980
75. A. M. Boichenko, V. S. Skakun, V. F. Tarasenko, E. A. Fomin and S. I. Yakovlenko, "Powerful exciplex flashlamps", Laser Phys. 3, 838-843, 1993
76. A. M. Boichenko, V. S. Skakun, V. F. Tarasenko, E. A. Fomin and S. I. Yakovlenko, "Cylindrical exilamp pumped by a barrier discharge", Laser Phys. 4, 635-637, 1994
77. V. F. Tarasenko, M. I. Lomaev, A. N. Panchenko, V. S. Skakun and E. A. Sosnin, "High-power UV excilamps", High Power Lasers - Science and Engineering, R. Kossowsky, M. Jelinek and R. F. Walter, Eds., 331-345, Kluwer Academic Publishers, Dordrecht, 1996
78. S. Bollanti, G. Clementi, P. Di Lazzaro, F. Flora, G. Giordano, T. Letardi, F. Muzzi, G. Shina and Z. E. Zheng, "Excimer lamp pumped by a triggered longitudinal discharge", IEEE Trans. Plasma Sci. 27, 211-218, 1999
79. V. M. Borisov, A. M. Davidovskii and O. B. Kristoforov, "Experimental investigation of the characteristics of a planar surface discharge", Sov. J. Quantum Electron. 12, 1403-1408, 1982
80. H. Esrom and U. Kogelschatz, "Metal deposition with a windowless VUV excimer source", Appl. Surf. Sci. 54, 440-444, 1992
81. M. Lenk and R. Mehnert, "Design and characteristics of a windowless argon excimer source", Proc. RadTech Europe, Basle, 153-158, 2001
82. th Int. Symp. on Ionizing Radiation and Polymers (IRaP 2002), Sainte-Adèle (Québec), Canada, 2002
83. M. Salvermoser and D. E. Murnick, "Efficient, stable, corona discharge 172nm xenon excimer light source", J. Appl. Phys. 94, 3722-3731, 2003
84. T. Efthimiopoulos, B. P. Stoicheff and R. I. Thompson, "Efficient population inversion in excimer states by supersonic expansion of discharge plasmas", Optics Lett. 14, 624-626, 1989
85. J. Kawanaka, S. Kubodera, W. Sasaki, K. Kurosawa, K. Misuhshi and T. Igarashi, "New xenon excimer lamps excited by quasi-cw jet discharges", IEEE J. Quant. Electron. 1, 852-858, 1995
86. A. El-Habachi and K. H. Schoenbach, "Generation of intense excimer radiation from high-pressure hollow cathode discharges", Appl. Phys. Lett. 73, 885-887, 1998
87. P. Kurunczi and K. Becker, "High-pressure microhollow cathode discharge plasmas: Novel sources of monochromatic vacuum ultraviolet radiation", 7th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone VII.), 2, 491-495, Greifswald, 2000
88. M. Moselhy and K. H. Schoenbach, "Excimer emission from cathode boundary layer discharges, subm. to J. Appl. Phys. 2003
89. P. Kurunczi, Radiative and collisional processes in a high-pressure micro-hollow cathode discharge, Ph D Thesis, Stevens Institute of Technology, 2003
90. J. Wieser, D. E. Murnick, A. Ulrich, H. A. Huggins, A. Liddle and W. L. Brown."Vacuum ultraviolet rare gas excimer light source", Rev, Sci. Instrum. 68, 1360-1364, 1997
91. J. Wieser, M. Salvermoser, L. H. Shaw, A. Ulrich, D. E. Murnick and H. Dahi, "Lyman-alpha emission via resonant energy transfer", J. Phys. B: At. Mol. Opt. Phys. 31, 4589-4597, 1998
92. 2 mixtures", Laser Phys. 13(2003), 10, in print
93. 2 mixtures", J. Phys. B.: At. Mol. Opt. Phys. 32, L651-L658, 1999
94. M. Moselhy, R. H. Stark, K. H. Schoenbach and U. Kogelschatz, "Resonant energy transfer from argon dimers to atomic oxygen in microhollow cathode discharges", Appl. Phys. Lett. 78, 880-882, 2001.
95. 2", subm. to Phys. Rev. Lett., 2003
96. J. Yan, A. El-Dakrouri, M. Laroussi and M. C. Gupta," 121.6 nm radiation source for advanced lithography", J. Vac. Sci. Technol. B 20, 2574-2577, 2002
97. M. Ilmer, R. Lecheler, H. Schweizer and M. Seibold, "Hg-free flat panel light source PLANON® - A promising candidate for future LCD backlights", SID International Symposium, Digest of Technical Papers, J. Morreal, Ed., XXXI, 931-933, Long Beach, CA, 2000
98. th International Syposium on Light Sources (LS-9), 411-421, Cornell University, Ithaca, NY., 2001
99. th Int. Display Res. Conf., 467-470, Seoul, 1998
100. H. Noguchi and H. Yano, "A mercury-free cold cathode fluorescent lamp for LCD backlighting", SID 00 Digest, 935-937, 2000
101. Y. Ikeda, T. Shiga, S. Mikoshiba, M. Tsuchiya, and S. Shinada, "Mercury-free, simple-structured flat discharge LCD backlights ranging from 0.5 to 5.2-in. diagonals", SID 00 Digest, 938-941, 2000
102. M. G. Kwak, and J. I. Han, "Mercury-free 18-in. flat fluorescent lamp with good uniformity", J. SID 9, 3, 165-168, 2001
103. T. Shiga, Y. Ikeda and S. Mikoshiba, "Mercury-free Xe flat discharge lamps for lighting", J. Light & Vis. Env. 25, 10-15, 2001
104. I. W. Boyd, J.-Y. Zhang and U. Kogelschatz, "Development and Applications of UV Excimer Lamps", Photo-Excited Processes, Diagnostics and Applications, A. Peled, Ed., 161-199, Kluwer Academic Publishers, The Netherlands, 2003
105. T. Oppenländer, Photochemical Purification of Water and Air, Advanced Oxidation Processes (AOPs): Principles, Reaction Mechanisms and Reactor Concepts, Wiley-VCH, Weinheim, 2002
106. T. Oppenländer, Potentials and Applications of Excimer Lamps (Incoherent Vacuum-UV/VUV Sources) in Photochemistry and in Photochemical Technology, http://www.stp-gateway.de/start/start2.html
107. R. Mehnert, "UV Curing Equipment - Monochromatic UV Lamps", UV and EB Curing Technology and Equipment, R. Mehnert, A. Pincus, I. Janorski, R. Stowe, A. Bereika, Eds., 83-105, John Wiley/SITA, 1999
108. R. Mehnert, "Excimer UV curing in printing", Proc. RadTech Europe 99, 303-310, Berlin, 1999
109. J.-Y. Zhang, G. Windall and I. W. Boyd, "UV curing of optical fibre coatings using excimer lamps", Appl. Surf. Sci. 186, 568-572, 2002
110. H. Esrom and U. Kogelschatz, "Modification of surfaces with new excimer UV sources", Thin Solid Films 218, 231-246, 1992
111. H. Esrom, J.-Y. Zhang and U. Kogelschatz, "Large area photochemical dry etching of polymers with incoherent excimer UV radiation", Mat. Res. Symp. Proc. 236, 39-45, 1992
112. J.-Y. Zhang, Photochemische Modifizierung von Oberflächen durch Excimer-UV-Strahlung, PhD Thesis, Technical University Karlsruhe, 1993
113. J.-Y. Zhang, H. Esrom, G. Emig and U. Kogelschatz, "Modification of polymers with UV excimer radiation from lasers and lamps", Polymer Surface Modification: Relevance to Adhesion, K. L. Mittal Ed., 153-185, VSP International Science Publishers, Utrecht, 1996
114. H. Esrom, J.-Y. Zhang and U. Kogelschatz, "Photochemical modification and etching of PTFE with excimer VUV/UV radiation", Polymer Surfaces and Interfaces: Charaterization, Modification and Application, K.L.Mittal and K.-W. Lee, Eds., 27-35, VSP International Science Publishers, Dordrecht, 1997
115. I. W. Boyd, V. Craciun and A. Kazor, "Vacuum-ultra-violet and ozone induced oxidation of silicon and silicon-germanium", Jpn. J. Appl. Phys. 32, 6141-6146, 1993
116. J.-Y. Zhang and I. W. Boyd, "Low temperature photo-oxidation of silicon using a xenon excimer lamp", Appl. Phys. Lett. 71, 2964-2966, 1997
117. J.-Y. Zhang, and I. W. Boyd, "Rapid photo-oxidation of silicon at room temperature using 126 nm vacuum ultraviolet radiation", Appl. Surf. Sci. 186, 64-68, 2002
118. I. W. Boyd, "Dielectric photoformation of Si and SiGe" Advances in Rapid Thermal & Integrated Processing, F. Roozeboom, Ed., 235-264, Kluwer, Dordrecht, 1996
119. V. Craciun, I. W. Boyd, B. Hutton and D. Williams, "Characteristics of dielectric layers grown on Ge by low temperature vacuum ultraviolet-assisted oxidation", Appl. Phys. Lett. 75, 1261-1263, 1999
120. 2* excimer source", Chemtronics 4, 202-208, 1989
121. J.-Y. Zhang and I. W. Boyd, "Investigations of photo-induced decomposition of palladium acetate for electroless copper plating", Thin Solid Films 318, 234-238, 1998
122. P. Bergonzo, U. Kogelschatz and I. W. Boyd, "Direct photo-deposition of silicon dioxide films using a xenon excimer lamp", Appl. Surf. Sci. 69, 393-397, 1993
123. P. Bergonzo and I. W. Boyd, "Low pressure photodeposition of silicon nitride films using a xenon excimer lamp", Appl. Phys. Lett.63, 1757-1759, 1993
124. P. Bergonzo and I. W. Boyd, "Photo-deposition of oxinitride and nitride films using excimer lamps", Microelectronic Eng. 25, 345-350, 1994
125. P. Bergonzo and I. W. Boyd, "Rapid photochemical deposition of silicon dioxide films using an excimer lamp", J. Appl. Phys. 76, 4372-4376, 1994
126. J.-Y. Zhang, L.-J. Bie, V. Dusastre and I. W. Boyd, "Thin tantalum oxide films prepared by 172 nm excimer lamp irradiation using sol-gel method", Thin Solid Films 318, 252-256, 1998
127. N. Kaliwoh, J.-Y. Zhang and I. W. Boyd, "Titanium dioxide films prepared by photo-induced sol-gel processing using 172 nm excimer lamps", Surf. Coat, Technol. 125, 424-427, 2000
128. J.-Y. Zhang and I. W. Boyd, "Low dielectric constant porous silica films formed by photo-induced sol-gel processing", Mat. Sci. Semicond. Process. 3, 345-349, 2000
129. J.-Y. Zhang and I. W. Boyd, "Photo-induced deposition of low dielectric constant polyimide film for interlayer dielectric applications", Electronic Lett. 33, 911-912, 1997
130. L. Jakob, Traitement des eaux par photocatalyse et photolyse V-UV: Degradation oxydative de polluants organiques, PhD Thesis, Ecole Polytechnique Fédéral de Lausanne, Switzerland, 1992
131. L. Jacob, T. M. Hashem, S. Bürki, N. M. Guindyand A. M. Braun "Vacuum- ultraviolet photolysis of water: oxidative degradation of 4-chlorophenol", J. Photochem. Photobiol. A: Chem. 75, 97-113, 1993
132. U. Kogelschatz, "UV production in dielectric barrier discharges for pollution control", Non-Thermal Plasma Techniques for Pollution Control, B. M. Penetrante and S. E. Schultheis, Eds., NATO ASI Series, Vol. G 34, Part B, 339-354, Springer, Berlin, 1993
133. D. Matter, H. Burtscher, U. Kogelschatz, L. Scherrer and H. C. Siegmann "Using photoemission caused by excimer UV-radiation sources to characterize soot particles", J. Aerosol Sci. 24, Suppl. 1, 365-366, 1993
134. H. Kitano, C. Takahashi and N. Ochi, "Trace moisture measurement in nitrogen by fluorescence method using argon excimer lamp", 7th Int. Symp. on Temperature and Thermal Measurements in Industry and Science (TEMPMEKO'99), Delft, 931, 1999
135. F. Mühlberger, J. Wieser, A. Ulrich and R. Zimmermann, "Single photon ionization (SPI) via incoherent VUV-excimer light: Robust and compact time-of-flight mass spectrometer for on-line real-time process gas analysis", Anal. Chem. A 74, 3790-3801, 2002